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Silicon Processing for the VLSI Era, Vol. 1: Process Technology, by Stanley Wolf, Richard N. Tauber
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- Sales Rank: #1051749 in Books
- Brand: Brand: Lattice Press
- Published on: 1999-10
- Released on: 1999-11-01
- Ingredients: Example Ingredients
- Original language: English
- Number of items: 1
- Dimensions: 9.75" h x 7.75" w x 2.00" l, 3.75 pounds
- Binding: Hardcover
- 960 pages
- Used Book in Good Condition
Most helpful customer reviews
25 of 28 people found the following review helpful.
Silicon Processing for the VLSI Era
By Jerry T. Healey
This book provides an outstanding presentation of Silicon processing technology that is technically current, rich in detail, and most importantly, factually correct. The new edition of this book appears to have been completely rewritten, and covers every important area of Silicon processing in a comprehensive manner. I especially enjoyed that fact that in each chapter of the book the basic principles underlying a technology are explained first, and these explanations are then integrated into descriptions of the relevant technology (i.e. PVD, CVD, CMP etc.).
The two Lithography sections are beautifully done, and contain lucid explanations of concepts that I have not seen anywhere else.
For anyone who is seriously interested in semiconductor manufacturing, this book is a "must have". No other volume even comes close to being this comprehensive.
7 of 8 people found the following review helpful.
Silicon Processing for the VLSI Era
By Jerry T. Healey
This book provides an outstanding presentation of Silicon processing technology that is technically current, rich in detail, and most importantly, factually correct. The new edition of this book appears to have been completely rewritten, and covers every important area of Silicon processing in a comprehensive manner. I especially enjoyed that fact that in each chapter of the book the basic principles underlying a technology are explained first, and these explanations are then integrated into descriptions of the relevant technology (i.e. PVD, CVD, CMP etc.).
The two Lithography sections are beautifully done, and contain lucid explanations of concepts that I have not seen anywhere else.
For anyone who is seriously interested in semiconductor manufacturing, this book is a "must have". No other volume even comes close to being this comprehensive.
9 of 11 people found the following review helpful.
THE best set of technical references in this area
By Dennis E. Schrope
In my 25 years of semiconductor process development I have never come across such a complete and in-depth collection of device and process knowledge in a single place. Years ago we needed to spend many hours with the journals to extract the requisite information to supplement our laboratory efforts. These volumes synthesize the basics with the most modern techniques now employed in advanced technologies. In addition, many subtle processing difficulties are addressed as well which will be much appreciated by the researcher. Through the years I have purchased in excess of 100 text references and none comes as close to these in the total knowledge contained within. These volumes are intended for the researchers and engineers working in this field yet they are so very well written and easy to comprehend that any one with such an interest in this field can understand them. Study these volumes completely.
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